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PROCESS AND SYSTEM FOR LASER CRYSTALLIZATION PROCESSING OF FILM REGIONS ON A SUBSTRATE TO PROVIDE SUBSTANTIAL UNIFORMITY WITHIN AREAS IN SUCH REGIONS AND EDGE AREAS THEREOF, AND A STRUCTURE OF SUCH FILM REGIONS
PROCESS AND SYSTEM FOR LASER CRYSTALLIZATION PROCESSING OF FILM REGIONS ON A SUBSTRATE TO PROVIDE SUBSTANTIAL UNIFORMITY WITHIN AREAS IN SUCH REGIONS AND EDGE AREAS THEREOF, AND A STRUCTURE OF SUCH FILM REGIONS
A kind of process and system, are provided for handling film sample and membrane structure. In particular, light-beam generator (110) can (100) issue continuous irradiation beam pulse (164) with scheduled repetitive rate. Each irradiation beam pulse can be covered, to limit multiple first beamlets and multiple second light beams. Each radiation pulses of multiple first and second beamlets come provide for impact membrane sample (170) and have intensity be enough at least partly to melt in this way, the film sample of irradiated portions section. The part membrane sample of specific part is irradiated the first pulse of beam pulse by first small light beam to melt the specific part of first area, first domain is at least partly to melt, it leaves between the first non-irradiated region in each adjacent first area, and allows to solidify and crystallize again. Specific part and the first beamlet after irradiation, the specific part irradiate again with specific part of the irradiation beam pulse of the second pulse of the second beamlet to melt second area on, the second area is at least partly to melt, it leaves in corresponding multiple adjacent second areas between the second non-irradiated region, and allows to solidify and crystallize again. First irradiation and again cured region and the second irradiation and the section film sample being mutually mixed in cured region again. In addition, first area corresponds to the first pixel, the secondth area corresponds to the second pixel.
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