首页> 外国专利> PROCESS AND SYSTEM FOR LASER CRYSTALLIZATION PROCESSING OF FILM REGIONS ON A SUBSTRATE TO PROVIDE SUBSTANTIAL UNIFORMITY WITHIN AREAS IN SUCH REGIONS AND EDGE AREAS THEREOF, AND A STRUCTURE OF SUCH FILM REGIONS

PROCESS AND SYSTEM FOR LASER CRYSTALLIZATION PROCESSING OF FILM REGIONS ON A SUBSTRATE TO PROVIDE SUBSTANTIAL UNIFORMITY WITHIN AREAS IN SUCH REGIONS AND EDGE AREAS THEREOF, AND A STRUCTURE OF SUCH FILM REGIONS

机译:在基板上进行胶片区域激光结晶处理的过程和系统,以在该区域和其边缘区域内提供基本均匀性,以及该胶片区域的结构

摘要

A kind of process and system, are provided for handling film sample and membrane structure. In particular, light-beam generator (110) can (100) issue continuous irradiation beam pulse (164) with scheduled repetitive rate. Each irradiation beam pulse can be covered, to limit multiple first beamlets and multiple second light beams. Each radiation pulses of multiple first and second beamlets come provide for impact membrane sample (170) and have intensity be enough at least partly to melt in this way, the film sample of irradiated portions section. The part membrane sample of specific part is irradiated the first pulse of beam pulse by first small light beam to melt the specific part of first area, first domain is at least partly to melt, it leaves between the first non-irradiated region in each adjacent first area, and allows to solidify and crystallize again. Specific part and the first beamlet after irradiation, the specific part irradiate again with specific part of the irradiation beam pulse of the second pulse of the second beamlet to melt second area on, the second area is at least partly to melt, it leaves in corresponding multiple adjacent second areas between the second non-irradiated region, and allows to solidify and crystallize again. First irradiation and again cured region and the second irradiation and the section film sample being mutually mixed in cured region again. In addition, first area corresponds to the first pixel, the secondth area corresponds to the second pixel.
机译:提供了一种用于处理膜样品和膜结构的方法和系统。特别地,光束发生器(110)可以(100)以计划的重复率发出连续的辐射束脉冲(164)。每个照射光束脉冲可以被覆盖,以限制多个第一子束和多个第二光束。多个第一子束和第二子束的每个辐射脉冲提供给冲击膜样品(170),并且具有至少部分地以这种方式熔化的强度,即被辐照部分的膜样品。特定部分的部分膜样品被第一小光束照射光束脉冲的第一脉冲以熔化第一区域的特定部分,第一区域至少部分地熔化,它离开每个相邻区域的第一非照射区域之间第一区域,并使其再次固化和结晶。特定部分和第一小束辐照后,该特定部分再次用第二小束的第二脉冲的辐照束脉冲的特定部分进行照射,以熔化第二区域,第二区域至少部分地熔化,它离开相应的区域在第二非照射区域之间具有多个相邻的第二区域,并且允许再次固化和结晶。第一次照射并再次固化的区域和第二次照射与切片膜样品再次在固化区域中相互混合。另外,第一区域对应于第一像素,第二区域对应于第二像素。

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