首页> 外国专利> Process for depositing thin layers on an organic substrate used in the production of flat displays comprises feeding a carrier gas into a gas flow sputtering source , and feeding the gas stream produced onto the substrate being coated

Process for depositing thin layers on an organic substrate used in the production of flat displays comprises feeding a carrier gas into a gas flow sputtering source , and feeding the gas stream produced onto the substrate being coated

机译:在用于生产平面显示器的有机基板上沉积薄层的方法包括将载气送入气流溅射源中,并将产生的气流送入要涂覆的基板上

摘要

Process for depositing thin layers (9) on an organic substrate (10) comprises feeding a carrier gas into a gas flow sputtering source having a target (5) partially made from the material being deposited, and feeding the gas stream (8) produced onto the substrate being coated. An independent claim is also included for a device for depositing thin layers on an organic substrate.
机译:在有机衬底(10)上沉积薄层(9)的方法包括将载气进料到气流溅射源中,该溅射源具有部分由待沉积材料制成的靶(5),并将进料到其中的气流(8)被涂覆的基材。还包括用于在有机基板上沉积薄层的装置的独立权利要求。

著录项

  • 公开/公告号DE10352516A1

    专利类型

  • 公开/公告日2005-06-16

    原文格式PDF

  • 申请/专利权人 SAMSUNG SDI CO. LTD.;

    申请/专利号DE2003152516

  • 发明设计人 GERLACH WERNER;

    申请日2003-11-04

  • 分类号C23C14/34;

  • 国家 DE

  • 入库时间 2022-08-21 22:01:08

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