WATER SYSTEM DISPERSING ELEMENT FOR CHEMICAL-MECHANICAL POLISHING AND CHEMICAL-MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING WATER SYSTEM DISPERSING ELEMENT FOR CHEMICAL-MECHANICAL POLISHING

摘要

PROBLEM TO BE SOLVED: To provide a water system dispersing element for chemical-mechanical polishing and a chemical-mechanical polishing method that are capable of efficiently polishing each of various objects to be polished and obtaining a fully planarized and accurately finished surface and where dishing and erosion will not worsen in wiring portions, if chemical-mechanical polishing is conducted for more than an optimal polishing time, and a kit for preparing the water system dispersing element for chemical-mechanical polishing.;SOLUTION: The water system dispersing element for chemical mechanical polishing includes (A) grain, (B) an organic acid, (C) benzotriazole or its derivatives, (D) poly(meta)acrylate, (E) an oxidizer, and (F) water, and the blended quantity of (A) grain is 2-10 wt.%.;COPYRIGHT: (C)2007,JPO&INPIT