SEMICONDUCTOR MANUFACTURING APPARATUS HAVING ULTRAVIOLET LIGHT IRRADIATION MECHANISM, AND TREATMENT METHOD OF SEMICONDUCTOR SUBSTRATE BY ULTRAVIOLET LIGHT IRRADIATION

摘要

PROBLEM TO BE SOLVED: To provide a method and apparatus for controlling a dielectric constant of a thin film evaporated on a substrate by ultraviolet light irradiation.;SOLUTION: Treatment apparatus of a semiconductor substrate includes a chamber 6 where pressure can be controlled in a range of vacuum to the vicinity of atmospheric pressure; a plurality of ultraviolet light-emitting bodies 8 set in the chamber 6; a heater 12 set in the chamber 6 facing the light-emitting bodies 8; and a filter 9 disposed between the light-emitting bodies 8 and the heater 12, the filter for making intensity of the ultraviolet light uniform; and in addition, has a structure for uniformly distributing the intensity of light from the light-emitting bodies 8 on the surface of the heater 12.;COPYRIGHT: (C)2006,JPO&NCIPI