首页> 外国专利> TRANSISTOR ARRAY, A METHOD FOR FABRICATING THE SAME, AN ACTIVE-MATRIX SUBSTRATE, A DISPLAY DEVICE, A JIG ASSEMBLY AND A FUNCTION LINE

TRANSISTOR ARRAY, A METHOD FOR FABRICATING THE SAME, AN ACTIVE-MATRIX SUBSTRATE, A DISPLAY DEVICE, A JIG ASSEMBLY AND A FUNCTION LINE

机译:晶体管阵列,一种用于制造该阵列的方法,一个有源矩阵基板,一个显示设备,一个夹具组件和一条功能线

摘要

The transistor array includes conductive lines, the functional lines and transistors. Each of the electrically conductive wire comprises a conductive layer covering the center line and the center line. Each of the function lines comprising an insulating layer and a semiconductor layer covering the surface of the insulating layer which covers the center line, the center line of the surface with at least a surface electrical conductivity. Each feature line is arranged to contact and intersect with the conductive wires. Each transistor is, one conductive line is defining the area of ​​intersection as a corresponding one of the function lines, the semiconductor layer and the ohmic contact and the first ohmic contact region in the semiconductor layer and the ohmic contact and the second ohmic contact areas in, and the between the first ohmic contact region and the second ohmic contact region comprises a channel region defined by these.
机译:晶体管阵列包括导线,功能线和晶体管。每条导电线包括覆盖中心线和中心线的导电层。每个功能线包括绝缘层和覆盖绝缘层表面的半导体层,该半导体层覆盖中心线,该表面的中心线至少具有表面导电性。每条特征线布置成与导线接触并相交。每个晶体管是,一条导线将相交区域定义为功能线,半导体层和半导体层中的欧姆接触和第一欧姆接触区域以及欧姆接触和第二欧姆接触中的相应一条第一欧姆接触区域和第二欧姆接触区域之间以及之间的区域包括由它们限定的沟道区域。

著录项

  • 公开/公告号KR100537114B1

    专利类型

  • 公开/公告日2005-12-16

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030018144

  • 申请日2003-03-24

  • 分类号G02F1/136;

  • 国家 KR

  • 入库时间 2022-08-21 21:27:17

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