METHOD FOR PERFORMING METALLO-ORGANIC CHEMICAL VAPOR DEPOSITION OF TITANIUM NITRIDE AT REDUCED TEMPERATURE

摘要

PURPOSE: A method for chemical vapor deposition a metal organic member of titanium nitride at a lowered temperature is provided to perform the deposition at a very low temperature. CONSTITUTION: A method for chemical vapor deposition a metal organic member of titanium nitride at a lowered temperature includes following steps. At the first step, a rinsing gas, an inert gas and metal organic chemical with at least 500 sccm liquid flow volume are supplied so as to form an inner chamber pressure of at least 2 torr. The chamber contains the substrate. The substrate is heated to disassemble the metal organic chemical, which forms a film on the substrate. The metal organic chemical according to the present invention further includes titanium. On the other hand, the titanium is dealkylamino-titanium or titanium nitride. The inert gas is selected from a group including nitride, helium, and argon.