pr amp; t.; fmedium to study the resistance of oberfl amp; auml; chen, with the pr amp; t.; fmedium a probek amp; all; body and apparatus to study the resistance of oberfl amp; auml; chen

摘要

pr & t.; fmediumto study the resistance of oberfl & auml; chen, characterizedthe pr & t.; fmediumat least 20 wt. -% of 3 - (4 - methoxyphenyl) - 2 - propens & auml; ure 2 ethylhexylester,at least 20 wt. -% of 2-ethylhexyl - 2 - cyano - 3.3 - diphenylacrylat, at least20 wt.% 3,3,5 - trimethylcyclohexylsalicylat and at least 20% w / wn, n-diethyl-m-toluamide covers.