Cross-Reference This application of the material related applications for the method and for imaging deep ultraviolet photoresist using a topcoat, United States Patent Application Serial No. 10 / 796,376 filed on March 9, 2004 This is a continuation-in-part application of U.S. Patent Application Serial Number 10 / 875,596 filed on June 24, 2004 is a continuation-in-part application. Contents of the application specification of these shall be deemed to have been published herein.

摘要

The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition comprising a polymer with at least one ionizable group having a pKSUBa /SUBranging from about -9 to about 11.