首页> 外国专利> METHOD OF MAKING MoO2POWDERS, PRODUCTS MADE FROM MoO2 POWDERS, DEPOSITION OF MoO2 THIN FILMS, AND METHODS OF USING SUCH MATERIALS

METHOD OF MAKING MoO2POWDERS, PRODUCTS MADE FROM MoO2 POWDERS, DEPOSITION OF MoO2 THIN FILMS, AND METHODS OF USING SUCH MATERIALS

机译:制备MoO2粉末的方法,由MoO2粉末制成的产品,MoO2薄膜的沉积以及使用此类材料的方法

摘要

The invention relates to high purity MoO2 powder by reduction of ammonium molybdate or molybdenum trioxide using hydrogen as the reducing agent in a rotary or boat furnace. Consolidation of the powder by press/sintering, hot pressing, and/or HIP is used to make discs, slabs, or plates, which are used as sputtering targets. The MoO2disc, slab, or plate form is sputtered on a substrate using a suitable sputtering method or other physical means to provide a thin film having a desired film thickness. The thin films have properties such as electrical, optical, surface roughness, and uniformity comparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITO in terms of transparency, conductivity, work function, uniformity, and surface roughness. The MoO2 and MoO2 containing thin films can be used in organic light-emitting diodes (OLED), liquid crystal display (LCD), plasma display panel (PDF), field emission display (FED), thin film solar cell, low resistivity ohmic contacts, and other electronic and semiconductor devices.
机译:本发明涉及一种高纯度的MoO 2粉末,该粉末通过在旋转炉或舟皿炉中使用氢作为还原剂还原钼酸铵或三氧化钼。通过压制/烧结,热压和/或HIP来固结粉末被用于制造用作溅射靶的盘,板或板。使用合适的溅射方法或其他物理手段将MoO 2盘,平板或平板形式溅射在基板上,以提供具有期望的膜厚度的薄膜。薄膜在透明性,导电性,功函数,均匀性和表面粗糙度方面具有与铟锡氧化物(ITO)和掺杂锌的ITO相当或更好的诸如电,光学,表面粗糙度和均匀性的性质。包含MoO2和MoO2的薄膜可用于有机发光二极管(OLED),液晶显示器(LCD),等离子显示面板(PDF),场发射显示器(FED),薄膜太阳能电池,低电阻欧姆接触,以及其他电子和半导体设备。

著录项

  • 公开/公告号IN2006DN00078A

    专利类型

  • 公开/公告日2007-08-24

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN78/DELNP/2006

  • 申请日2006-01-04

  • 分类号H01L51/50;H01L33/42;H01J11/02;C04B35/495;C23C14/34;H05B33/28;H01J31/12;H01L21/203;H01L51/54;H05B33/14;C23C14/08;H01L51/52;H01B1/08;H01L31/04;G02F1/1343;C01G39/02;C01G39/00;

  • 国家 IN

  • 入库时间 2022-08-21 20:58:00

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