SUBSTRATE CONVEYING TREATMENT DEVICE, OBSTACLE COUNTERMEASURE METHOD IN SUBSTRATE CONVEYING TREATMENT DEVICE AND THE STORAGE MEDIUM THAT MEMORIZED AN OBSTACLE COUNTERMEASURE PROGRAM

摘要

The present invention post-exposure bake (PEB) module 15, a developing module (12 after the exposure from the substrate transfer apparatus, the substrate interference countermeasure method and disturbance measures program to an exposure apparatus (5) relates to a storage medium storing the in the transport apparatus ), development bake module 15 after exposure through a process that may jimyeo pre-determined in the PEB module to the process module in the downstream side on the basis of the transport schedule not be transporting the substrate in the substrate transport path modules (11-17 ) or the solution means in case a failure occurred to the transport module 20 is disclosed. In this case, the processes up to the PEB process of repeatedly after the exposure process to the substrate after the exposure being conducted PEB process is a wafer (W), the buffer modules 32 between the up are brought to interference eliminated buffer module 32 complete It is secured temporarily in. Thereby, even if interference occurs, it is possible to prevent the time until PEB process from the post-exposure treatment longer provides a resist particular technique avoided a problem with the line width of a circuit of a chemically-amplified resist pattern.