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SOG COATER IN SEMICONDUCTOR MANUFACTURING PROCESS AND THE SOG PROCESS USING THE SAME
SOG COATER IN SEMICONDUCTOR MANUFACTURING PROCESS AND THE SOG PROCESS USING THE SAME
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机译:半导体制造过程中的SOG涂层及其使用的SOG过程
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摘要
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor process, and more particularly, to a spin on glass (SOG) process of a semiconductor process. The SOG applicator according to the present invention includes a drive motor, a drive shaft connected to the drive motor, a spin cup on which a predetermined substrate is placed while receiving rotational force from the drive motor through the drive shaft, and spraying a predetermined coating liquid on the substrate. It characterized in that it comprises a coating liquid nozzle and a gas nozzle for injecting a gas to the coating liquid, according to the present invention, the gap fill defect generated at the edge of the substrate by coating the coating liquid evenly by the gas injection after the injection of the coating liquid in the SOG process It is effective in preventing and improving the reliability and yield of the semiconductor device.;Spin On Glass (SOG), Gap-fill Deffect, Gas Nozzle
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