首页> 外国专利> Floating gate memory cell and production process has channel with tunnel dielectric, floating gate and control gate regions and different writing and erasing energy barriers

Floating gate memory cell and production process has channel with tunnel dielectric, floating gate and control gate regions and different writing and erasing energy barriers

机译:浮栅存储单元及其生产工艺的沟道具有隧道电介质,浮栅和控制栅区域以及不同的写和擦除能垒

摘要

A floating gate memory cell comprises two source/drain regions on a substrate joined by a channel over which are, sequentially, a tunnel dielectric, a floating gate region, a control gate dielectric and a control gate. The tunnel dielectric is so directed that a write tunnel energy barrier is produced when writing data by which tunneling of charge carriers into the floating gate region is enabled. On erasing data an erase energy barrier is formed and the control gate so directed that the erase energy barrier is lower than the writing energy barrier. An independent claim is also included for a production process for the above.
机译:浮栅存储单元包括在衬底上的通过沟道连接的两个源/漏区,在其上依次是隧道电介质,浮栅区,控制栅电介质和控制栅。引导隧道电介质,使得在写入数据时产生写入隧道能量势垒,从而使电荷载流子能够隧穿到浮栅区中。在擦除数据时,形成擦除能量屏障,并且控制栅被定向为使得擦除能量屏障低于写入能量屏障。上述内容的生产过程也包括独立权利要求。

著录项

  • 公开/公告号DE102005053718A1

    专利类型

  • 公开/公告日2007-05-24

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20051053718

  • 发明设计人 KAKOSCHKE ROLAND;

    申请日2005-11-10

  • 分类号H01L27/115;H01L21/8247;G11C11/40;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:38

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