VACUUM VAPOR-DEPOSITION APPARATUS AND VACUUM VAPOR-DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for stably forming an optical thin film on a plastic film at a high speed, by depositing a vapor-deposition material of a fluoride which does not absorb light on the plastic film with an electron beam heating vapor-deposition technique, and to provide an apparatus for forming the optical thin film.;SOLUTION: When forming the optical thin film on the plastic film substrate without heating the substrate with the electron beam heating vapor-deposition technique which uses the vapor-deposition material made from the fluoride as the target, this vacuum vapor-deposition method includes using a sintered compact as the vapor-deposition material so as to keep film-forming stability; and further irradiating a target material 6 with a lamp 5 to assist heating. The vacuum vapor-deposition method also includes measuring the temperature of the vapor-deposition material 6 with an infrared radiation thermometer 7 in the above step, and keeping the temperature of the vapor-deposition material 6 in a predetermined temperature range by feeding back the temperature of the vapor-deposition material 6 to an electric power to be used for an electron beam or to the intensity of the lamp through a control circuit device, so as to keep a film-forming rate constant.;COPYRIGHT: (C)2008,JPO&INPIT