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LOW-VOLTAGE ORGANIC THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD

机译:低压有机薄膜晶体管及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide an organic thin film transistor capable of low voltage operation and commercialization with ease by forming a gate insulating film having a thickness of a few nanometers, while forming it on a plastic substrate, a glass substrate, etc. in a low-temperature process.;SOLUTION: A metal is patterned on a substrate and vapor-deposited to form a gate electrode 12, and then the gate electrode 12 is directly oxidized at a normal temperature to 100°C in O2 plasma process to grow a metal oxide film having a thickness of 10 nm or less, thereby the gate insulating film 13 is formed along the surface of the gate electrode. Then an organic semiconductor film 14 is vapor-deposited on the gate insulating film 13, and source/drain electrodes 15/16 are formed on the organic semiconductor film 14 with a certain distance from each other. When forming a double gate insulating film, an organic insulating film is formed on the metal oxide film in a self-assembly process or a spin coating process.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:通过形成厚度为几纳米的栅极绝缘膜,同时在塑料基板,玻璃基板等上形成有机绝缘薄膜晶体管,以提供易于进行低压操作和商品化的有机薄膜晶体管。解决方案:将金属图案化在基板上并气相沉积以形成栅电极12,然后在常温下于O 2中将栅电极12直接氧化至100℃ 等离子体工艺以生长厚度为10 nm或更小的金属氧化物膜,从而沿着栅电极的表面形成栅绝缘膜13。然后,将有机半导体膜14气相沉积在栅极绝缘膜13上,并且源/漏电极15/16以一定距离彼此形成在有机半导体膜14上。当形成双栅绝缘膜时,有机绝缘膜通过自组装工艺或旋涂工艺形成在金属氧化物膜上。版权所有:(C)2008,JPO&INPIT

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