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System and a Method for Generating Periodic and/or Quasi-Periodic Pattern on a Sample
System and a Method for Generating Periodic and/or Quasi-Periodic Pattern on a Sample
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机译:用于在样本上生成周期性和/或准周期性模式的系统和方法
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摘要
A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.
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