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A METHOD OF PREPARATION OF A NOVEL SOL FOR DEPOSITION OF ELECTROCHROMIC TUNGSTEN OXIDE THIN FILMS

机译:一种用于沉积电致氧化钨薄膜的新型溶胶的制备方法

摘要

40-120 ml of water at ambient temperature, treating the solution so obtained with mineral acid of concentration in the range of 3N-6N to obtain a precipitate, separating the precipitate from the mother liquor by filtration, washing the precipitate with water free from organic and inorganic contaminants till complete removal of metal cation of the tungstate and anion of the acid, •4 dissolving the washed precipitate in a mixture of 20-30% aqueous solution of Q hydrogen peroxide with glacial acetic acid in a ratio in the range of H2O2 O
机译:在室温下用水40-120ml,用浓度为3N-6N的无机酸处理所得溶液,得到沉淀,通过过滤将沉淀与母液分离,用水洗涤沉淀,除去有机物。和无机污染物,直到完全去除钨酸的金属阳离子和酸的阴离子为止;•4将洗涤后的沉淀物溶解在比例为H2O2的20-30%Q过氧化氢水溶液与冰醋酸的混合物中Ø

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