首页> 外国专利> ELECTROMAGNETIC WAVE GENERATING SOURCE PROBING DEVICE, METHOD THEREFOR AND ANALYZING METHOD THEREFOR

ELECTROMAGNETIC WAVE GENERATING SOURCE PROBING DEVICE, METHOD THEREFOR AND ANALYZING METHOD THEREFOR

机译:电磁波产生源探测装置,其方法和分析方法

摘要

There are provided electromagnetic wave source detecting apparatus and method as well as electro-magnetic wave source analyzing system and method which can detect and analyze a source of (electromagnetic disturbing wave) representing a main factor in generating an electromagnetic field remotely of the apparatus in order to suppress the electromagnetic field intensity at the remote distance from the apparatus to below a regulated value. In the present invention, a magnetic field near an object 110 to be measured is measured by a set of at least two or more probes 101 and 102, a position of an electromagnetic wave source is detected through simplified calculation of one function using a phase difference between the two probes, a current distribution on the measured object is determined by solving simultaneous equations containing the position information and magnitudes of measured magnetic fields and an electromagnetic field at a remote distance from the apparatus is determined from the current distribution, thereby identifying the source representing the main factor in generating the electromagnetic field remotely of the apparatus. IMAGE
机译:提供了一种电磁波源检测装置和方法以及电磁波源分析系统和方法,其可以按顺序检测和分析代表在远程产生电磁场的主要因素的(电磁干扰波)源。以将远离设备的远距离的电磁场强度抑制到规定值以下。在本发明中,通过一组至少两个或更多个探头101和102来测量待测物体110附近的磁场,通过使用相差简化对一个函数的计算来检测电磁波源的位置。在两个探头之间,通过求解包含位置信息和被测磁场大小的联立方程来确定被测物体上的电流分布,并从该电流分布确定距设备较远的电磁场,从而确定源代表了在设备远端产生电磁场的主要因素。 <图像>

著录项

  • 公开/公告号EP1174722A4

    专利类型

  • 公开/公告日2008-08-20

    原文格式PDF

  • 申请/专利权人 HITACHI LTD.;

    申请/专利号EP20000917414

  • 发明设计人 UESAKA KOUICHI;SHINBO KENICHI;

    申请日2000-04-21

  • 分类号G01R29/08;G01B7/00;G01S5/12;

  • 国家 EP

  • 入库时间 2022-08-21 19:59:46

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