Photo masks arrangement, an optical imaging system, method for determining the grating parameters and absorption properties for a diffractive optical element, and method for producing a diffractive optical element

摘要

A photo masks arrangement or an optical imaging system comprises a diffractive optical element. The diffractive optical element comprises grid regions, the grid with defined grating parameters and absorption elements with defined absorption properties, wherein each grating region with an associated mask area corresponds with masks structure elements. The diffractive optical element can deviations of the dimensions of the resist structure elements, the of the associated masks structure elements are obtained, correcting, wherein the deviations due to deviations of the dimensions of the masks structure elements or by local deviations and aberrations of the imaging system can be caused.