首页> 外国专利> DEFECT DETECTING METHOD FOR MULTILAYER ELECTRONIC COMPONENT, AND METHOD OF MANUFACTURING MULTILAYER ELECTRONIC COMPONENT

DEFECT DETECTING METHOD FOR MULTILAYER ELECTRONIC COMPONENT, AND METHOD OF MANUFACTURING MULTILAYER ELECTRONIC COMPONENT

机译:多层电子元件的缺陷检测方法及制造多层电子元件的方法

摘要

PPROBLEM TO BE SOLVED: To provide a defect detecting method for a multilayer electronic component, which is useful to improve manufacturing processes and can improve the development speed of the multilayer electronic component which is made more compact, thinner, and more multilayered, and to provide a method of manufacturing the multilayer electronic component using the same. PSOLUTION: The defect detecting method of the multilayer electronic component includes the steps of: providing a mark M on an external layer surface or in the external layer of a green stack 4a to be cut so that it corresponds to a green chip 4b having been cut; cutting the green stack 4a to obtain a plurality of green chips 4b; and inspecting the green chips 4b and specifying a defect occurrence position of the green stack 4a from a mark M of a defective green chip 4b. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种用于多层电子部件的缺陷检测方法,该方法可用于改进制造工艺并可以提高多层电子部件的开发速度,该多层电子部件变得更紧凑,更薄,越来越多层,并且提供一种使用该方法制造多层电子部件的方法。

解决方案:多层电子部件的缺陷检测方法包括以下步骤:在要切割的生坯叠层4a的外层表面或外层上提供标记M,使其对应于生坯芯片4b。被切割切割生坯堆叠4a以获得多个生坯芯片4b;检查生坯4b,并从有缺陷的生坯4b的标记M确定生坯堆叠4a的缺陷发生位置。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009135322A

    专利类型

  • 公开/公告日2009-06-18

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP20070311249

  • 发明设计人 YAGI HIROSHI;MORI MASAHIRO;ITO TOSHIFUMI;

    申请日2007-11-30

  • 分类号H01G13;H01G4/12;H01G4/30;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:59

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