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COMPOSITION FOR MANUFACTURING HEAT RAY-SHIELDING VINYL CHLORIDE FILM AND METHOD OF MANUFACTURING THE SAME, AND HEAT RAY-SHIELDING VINYL CHLORIDE FILM
COMPOSITION FOR MANUFACTURING HEAT RAY-SHIELDING VINYL CHLORIDE FILM AND METHOD OF MANUFACTURING THE SAME, AND HEAT RAY-SHIELDING VINYL CHLORIDE FILM
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机译:制造热屏蔽光的氯乙烯薄膜的组合物及其制造方法和热屏蔽光的氯乙烯薄膜
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摘要
PROBLEM TO BE SOLVED: To provide a composition for manufacturing a heat ray-shielding vinyl chloride film which can apply to an ordinary vinyl chloride film manufacturing process and method of manufacturing the same.;SOLUTION: The method of manufacturing the composition for manufacturing a heat ray-shielding vinyl chloride film comprises: a process of obtaining a dispersion liquid by dispersing into an organic solvent tungsten oxide fine particles represented by the general formula, WOx and/or multiple tungsten oxide fine particles represented by the general formula, MyWOz and having a hexagonal crystal structure, and a dispersant; a process of obtaining a mixture by mixing the dispersion liquid with a plasticizer for manufacturing a vinyl chloride film; and a process of obtaining the composition for manufacturing the heat ray-shielding vinyl chloride film by removing the organic solvent until to a concentration of the solvent of not greater than 5 wt.% by a vacuum distillation method.;COPYRIGHT: (C)2009,JPO&INPIT
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机译:解决的问题:提供一种用于热辐射屏蔽氯乙烯膜的组合物,该组合物可用于普通的氯乙烯膜的制造方法及其制造方法。射线屏蔽氯乙烯膜包括:通过将通式WO x Sub>表示的氧化钨细颗粒和/或以下通式表示的多个氧化钨细颗粒分散在有机溶剂中而获得分散液的方法:通式M y Sub> WO z Sub>,具有六方晶体结构和分散剂。通过将分散液与增塑剂混合以制备氯乙烯膜而获得混合物的方法;以及通过真空蒸馏法除去有机溶剂直至溶剂的浓度不大于5wt。%而获得用于制备热射线屏蔽氯乙烯膜的组合物的方法。版权所有:(C)2009 ,JPO&INPIT
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