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ARC PLASMA VAPOR-DEPOSITION APPARATUS AND ARC PLASMA VAPOR-DEPOSITION METHOD

机译:电弧等离子体汽相沉积装置和电弧等离子体汽相沉积方法

摘要

PROBLEM TO BE SOLVED: To provide an arc plasma vapor-deposition apparatus which can produce a metal catalyst having a high carrying density and a fine particle diameter, and to provide an arc plasma vapor-deposition method.;SOLUTION: The arc plasma vapor-deposition apparatus 100A includes: an arc plasma-generating device composed of a power source 20 and an arc vapor-deposition source 10; a decompression vessel 8 which communicates with the arc plasma-generating device and also accommodates or mounts a material to be vapor-deposited thereon therein, and of which the inside is controlled to a decompressed atmosphere; and a cooling device 80 for cooling the material to be vapor-deposited thereon; and irradiates the material to be vapor-deposited thereon with the arc plasma having a peak energy of approximately 30 eV.;COPYRIGHT: (C)2009,JPO&INPIT
机译:要解决的问题:提供一种电弧等离子体气相沉积设备,该设备可以生产具有高载流密度和细粒径的金属催化剂,并提供一种电弧等离子体气相沉积方法。沉积装置100A包括:电弧等离子体产生装置,其由电源20和电弧气相沉积源10组成;减压容器8,其与电弧等离子体产生装置连通,并且还在其内容纳或安装将要气相沉积的材料,并且将其内部控制为减压气氛;冷却装置80,用于冷却蒸镀材料。并用具有约30 eV峰值能量的电弧等离子体辐照要在其上气相沉积的材料。版权所有(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009144222A

    专利类型

  • 公开/公告日2009-07-02

    原文格式PDF

  • 申请/专利权人 TOYOTA MOTOR CORP;

    申请/专利号JP20070324962

  • 发明设计人 ISHIMARU YOICHI;HAMA YUICHIRO;

    申请日2007-12-17

  • 分类号C23C14/24;H05H1/48;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:43

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