首页> 外国专利> HYDROGEN CHLORIDE GAS EJECTING NOZZLE, REACTION APPARATUS FOR PRODUCING TRICHLOROSILANE, AND METHOD FOR PRODUCING TRICHLOROSILANE

HYDROGEN CHLORIDE GAS EJECTING NOZZLE, REACTION APPARATUS FOR PRODUCING TRICHLOROSILANE, AND METHOD FOR PRODUCING TRICHLOROSILANE

机译:氯化氢气体喷射喷嘴,用于制备三氯硅烷的反应装置以及用于制备三氯硅烷的方法

摘要

PROBLEM TO BE SOLVED: To provide a hydrogen chloride gas ejecting nozzle member capable of suppressing clogging by metal silicon powder and capable of enhancing production efficiency of trichlorosilane by widely dispersing hydrogen chloride gas.;SOLUTION: The hydrogen chloride gas ejecting nozzle member 1 is used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member 1 is provided with a shaft portion 2 extending in the longitudinal direction and a head portion 3 extending in a direction intersecting the longitudinal direction of the shaft portion 2. A supply hole 4 extending in the longitudinal direction is formed in the shaft portion 2, a plurality of ejection holes 5 are formed in the head portion 3, and each of the ejection holes 5 is communicatively connected to the supply hole 4 and opened on the outer surface of the head portion 3 toward a direction intersecting the direction to which the supply hole 4 extends.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种氯化氢气体喷嘴构件,其能够抑制金属硅粉的堵塞,并且能够通过广泛分散氯化氢气体来提高三氯硅烷的生产效率。解决方案:使用氯化氢气体喷嘴构件1。在用于生产三氯硅烷的反应设备中,其中金属硅粉与氯化氢气体反应生成三氯硅烷。构件1设置有沿长度方向延伸的轴部2和沿与轴部2的长度方向相交的方向延伸的头部3。在轴部2上形成有沿长度方向延伸的供给孔4。并且,在头部3上形成有多个喷出口5,各喷出口5连通地与供给孔4连通,并在喷头部3的外表面上向与喷出口5交叉的方向开口。供给孔4延伸。;版权所有(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009120468A

    专利类型

  • 公开/公告日2009-06-04

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP20080197072

  • 发明设计人 INABA TSUTOMU;

    申请日2008-07-30

  • 分类号C01B33/107;

  • 国家 JP

  • 入库时间 2022-08-21 19:41:43

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