OPTICAL PROXIMITY EFFECT CORRECTION METHOD AND DEVICE, OPTICAL PROXIMITY EFFECT VERIFICATION METHOD AND DEVICE, METHOD FOR MANUFACTURING EXPOSURE MASK, AND OPTICAL PROXIMITY EFFECT CORRECTION PROGRAM AND OPTICAL PROXIMITY EFFECT VERIFICATION PROGRAM

摘要

PROBLEM TO BE SOLVED: To reduce the calculation time for proximity correction and to improve pattern accuracy.;SOLUTION: The optical proximity correction method includes: setting either a circumscribed rectangle of a pattern to be corrected or a layout resulting from resizing the pattern to be corrected by a distance over which the optical proximity effect reaches, as a pattern matching zone; referring to a correction table by using the layout of the set pattern matching zone as an index; calculating a corrected pattern of the pattern to be corrected by performing optical proximity correction on the entire pattern matching zone when the layout of the pattern matching zone is not stored in the correction table; when the layout of the pattern matching zone and a pattern after optical proximity correction corresponding to the layout of the stored pattern matching zone are stored in the correction table, reading the corresponding corrected pattern; and correcting a design pattern in accordance with either the obtained corrected pattern or the corrected pattern read from the correction table.;COPYRIGHT: (C)2009,JPO&INPIT