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Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
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机译:用于将半导体器件图案分解为相和铬区域以进行无铬相光刻的方法和装置
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摘要
A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).
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