首页> 外国专利> Projecting method of reflecting surfaces of reflecting devices using thermal field-radiation and wave equation analogy, and light arrangement like device designed for numeric optimization of required light parameters of reflecting surfaces

Projecting method of reflecting surfaces of reflecting devices using thermal field-radiation and wave equation analogy, and light arrangement like device designed for numeric optimization of required light parameters of reflecting surfaces

机译:使用热场辐射和波动方程类比的反射装置反射面的投影方法,以及为反射面所需的光参数进行数值优化而设计的类似装置的光布置

摘要

Ways to design the reflective surfaces of reflective devices using the analogy of the temperature-field radiation and wave equation describing the propagation of light, which is characterized in that the first source of light will illuminate the reflective surface reflecting light, which is in the target area evaluated using the variables of luminous flux, then changes geometry reflective surface by changing the angle of the beam of the transmitted light source to the surface of the reflective surface, whereupon using the aforementioned variables of temperature field provides formulas for calculation of quantities of the light field and the actual calculation apply Snell's laws of optics, then the reflective surface and their geometry is formed by requirement light flux .fi. or radiant flux .FI..sub.en. Means in the form of the lighting system intended for numerical optimization of desired light parameter reflecting surfaces comprises at least one light source (1) whose light beam passes through at least one optical deformation elements (9) provided with a reflective surface (2) inside which is provided at least one slot (10) with the medium (8) with a different refractive index to their reflecting surfaces (6), whereby the refractive index of the reflective surfaces (5, 6) is elected way that the required luminous flux .fi. or the total radiant flux .FI..sub.en impact point on the impact area equaled the desired luminous flux .fi. or total radiant flux .FI..sub.en.
机译:使用描述光传播的温度场辐射和波动方程的类比来设计反射设备的反射表面的方法,其特征在于,第一光源将照亮目标中反射光的反射表面使用光通量变量评估的面积,然后通过更改透射光源的光束相对于反射面表面的角度来更改反射面的几何形状,从而使用上述温度场变量提供用于计算反射量的公式光场和实际计算应用了斯涅尔光学定律,然后通过要求的光通量.fi形成反射表面及其几何形状。或辐射通量用于期望的光参数反射面的数值优化的照明系统形式的装置包括至少一个光源(1),其光束穿过至少一个在内部具有反射面(2)的光学变形元件(9)至少在一个狭缝(10)中设有介质(8),该介质(8)的折射率与其反射面(6)的折射率不同,从而反射面(5、6)的折射率被选择为所需的光通量.fi。或撞击区域上的总辐射通量FIen等于所需的光通量fi。或总辐射通量

著录项

  • 公开/公告号CZ200865A3

    专利类型

  • 公开/公告日2009-08-12

    原文格式PDF

  • 申请/专利权人 KROUTILOVA EVA;

    申请/专利号CZ200865

  • 发明设计人 KROUTILOVA EVA;

    申请日2008-02-04

  • 分类号G02B17;

  • 国家 CZ

  • 入库时间 2022-08-21 19:28:15

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