PHOTOSENSITIVE RESIN COMPOSITION FOR INCREASING POLYMERIZATION HARDENING PROPERTY, A PHOTOSPACER, A METHOD FOR PRODUCING THE SAME, A PROTECTION FILM, A COLORED PATTERN, A SUBSTRATE FOR A DISPLAY DEVICE, AND A DISPLAY DEVICE

摘要

PURPOSE: A photosensitive resin composition is provided to form a pattern structure or a protective film in low temperature heating or non-heating process and to increase polymerization hardening property in light exposure.;CONSTITUTION: A photosensitive resin composition includes a resin, a polymerizable compound, and a photopolymerization initiator. The polymerizable compound has a structural component of formula (I), wherein X is a hydrogen atom or methyl group and * is a bond. A method for manufacturing a photo spacer comprises the steps of: forming a film of the photosensitive resin composition on a substrate; exposing at least part of film to the light; and developing the film after exposure.;COPYRIGHT KIPO 2010