METHOD TO ELIMINATE DEFECTS IN SKIN GRAIN PATTER LAYER WITH NATURAL FRAIN PATTERN AND SKIN WITH ELIMINATED GRAIN PATTERN DEFECTS

摘要

FIELD: process engineering.;SUBSTANCE: proposed method comprises eliminating defects representing damages sports (3) in layers (2) formed by recesses in skin (1) with natural grain patter. These defects are eliminated as follows, i.e. water or slightly foamed plastic suspension is forced into aforesaid recesses, the said suspension containing ultimate solid particles. Then skin (1) is dried, surface (4) of the layer of grain pattern (2) is subjected to pressure and thermal treatment with the help of pressure roller at least 100°C. Note here that plastic mass is formed in aforesaid recesses that contains hollow tiny balloons (5) made up of solid particles to completely fill the said recesses (dwg. 1).;EFFECT: higher quality.;13 cl, 1 dwg, 1 ex