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Electropolishing electrolyte and method for planarizing a metal layer using the same.

机译:电抛光电解质和使用该电解质抛光金属层的方法。

摘要

The present electropolishing electrolyte comprises an acid solution and an alcohol additive having at least one hydroxyl group, wherein the contact angle of the alcohol additive is smaller than the contact angle of the acid solution on a metal layer under electropolishing is. The alcohol additive is selected from methanol, ethanol and glycerol, and the acid solution comprising phosphoric acid. The volume ratio of glycerol to phosphoric acid is between 1:50 and 1: 200, and is preferably 1: 100. The volume ratio is between 1: 100 and 1: 150 for methanol to phosphoric acid, and between 1: 100 and 1: 150 for ethanol to phosphoric acid. In addition, the acid solution comprises an organic acid which is selected from the group consisting of acetic acid and citric acid. The concentration is 10,000 to 12,000 ppm for the acetic acid, and between 500 and 1000 ppm for citric acid.
机译:本发明的电抛光电解质包括酸溶液和具有至少一个羟基的醇添加剂,其中该醇添加剂的接触角小于在电抛光下酸溶液在金属层上的接触角。醇添加剂选自甲醇,乙醇和甘油,以及包含磷酸的酸溶液。甘油与磷酸的体积比为1:50至1:200,优选为1:100。甲醇与磷酸的体积比为1:100至1:150,1:100至1 :乙醇至磷酸为150。另外,酸溶液包含选自由乙酸和柠檬酸组成的组的有机酸。乙酸的浓度为10,000至12,000 ppm,柠檬酸的浓度为500至1000 ppm。

著录项

  • 公开/公告号CH698385B1

    专利类型

  • 公开/公告日2009-07-31

    原文格式PDF

  • 申请/专利权人 BASF AKTIENGESELLSCHAFT;

    申请/专利号CH20070000561

  • 发明设计人 SHIEH JIA MIN;TONG DAI BOU;LIU SUE HONG;

    申请日2005-10-01

  • 分类号C25F3/20;B23H5/12;H01L21/321;

  • 国家 CH

  • 入库时间 2022-08-21 19:09:56

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