Structure, useful in the field of aeronautics/aerospace, comprises metal substrate and mesostructured layer prepared from metal precursor molecule comprising hydrolysable groups of alkoxide/metal halide in presence of texturing agent

摘要

Structure comprises metal substrate and at least a mesostructured layer prepared, by sol-gel process, from at least a metal precursor molecule comprising one or more hydrolysable groups of alkoxide or metallic halide type, preferably metallic alkoxide, or alkynylmetal compounds (A), in the presence of at least a texturing agent. Structure comprises metal substrate and at least a mesostructured layer prepared, by sol-gel process, from at least a metal precursor molecule comprising one or more hydrolysable groups of alkoxide or metallic halide type, preferably metallic alkoxide, or alkynylmetal compounds (A) of formula (MZ n) (1), (L(m) xMZ n - mx) (2), (R11 x 1 1M11Z 4 - x) (3) or (Z 3M11-R12-M11Z 3) (4) in the presence of at least a texturing agent comprising: elementary nanoblocks in the form of cluster or nanoparticles, mainly based on at least one metal oxide; ionic amphiphilic surfactants in which the counter-ion is neodymium (Nd 3 +), praseodymium (Pr 3 +), cobalt (Co 3 +), cerium (Ce 3 +and Ce 4 +) when the surfactant is anionic, and comprising vanadate, molybdate and permanganate anions when the surfactant is cationic; and amphiphilic surfactants carrying one or more active anticorrosion organic functions and/or complexing metal ions. M : Al(III), Ce(III), Ce(IV), Si(IV), Zr(IV), Sn(IV), Hf(IV), Nb(V), V(V), Ta(V) or rare earth, the number in parenthesis is the valence of the atom M; n : valence of the atom M; x : 1 to n-1; M11 : Si(IV) or Sn(IV); x11 : 1-3; R : 1-4C alkyl; R11 : non-hydrolysable group comprising 1-4C alkyl, 2-4C alkenyl, 2-4C alkynyl, 6-10C aryl, methacryl or methacryloxy(1-10C alkyl), epoxyalkyl or epoxyalkoxyalkyl in which the alkyl group is linear, branched or cyclic 1-10C and the alkoxy group has 1-10C, 2-10C haloalkyl, 2-10C perhaloalkyl, 2-10C mercaptoalkyl, 2-10C aminoalkyl, (2-10C aminoalkyl)amino(2-10C alkyl), di(2-10C alkylene)triamino(2-10C alkyl) or imidazolyl(2-10C alkyl); L : monodentate or polydentate complexing ligand, preferably polydentate ligand; m : ligand hydroxylation index; and R12 : 1-12C alkylene, 1-12C alkynylene, N,N-di(2-10C alkylene)amino, bis[N,N-di(2-10C alkylene)amino], 2-10C mercaptoalkylene, (2-10C alkylene)polysulfide, 2-4C alkenylene, 6-10C arylene, di(2-10C alkylene)6-10C arylene, N,N'-di(2-10C alkylene) ureido, thiophene, 2-20C aliphatic, aryl type polyethers or polythioethers, crown ethers, organosilanes, 1-18C fluoroalkylene, viologen moiety or trans-1,2-bis(4-pyridylpropyl)ethene. Provided that when: M or M11 is not represent Sn, then Z is halo or -OR; and M or M11 Sn and then Z is halo, -OR or alkynyl (-C?=C-R13), where R13 is 1-10C alkyl, 6-10C aryl, 7-16C alkylaryl, 7-16C arylalkyl. An independent claim is included for a process for preparing the structure, comprising preparing a sol-gel materials by hydrolysis-condensation of the metal precursor molecule (A), in an aqueous or water/alcohol medium in the presence of acid, at least one texturing agent and optionally at least one additional functionalization agent, and optionally in the presence of a latex, depositing the obtained material on a metallic substrate, by dipping, depositing on non-coated substrate, spinning, sprinkling, spraying, coating or laminar depositing in the brush, optionally performing thermal, chemical or UV treatment of the coated substrate, or combining all three treatments for densification of the network, and optionally repeating depositing and treating steps, and preparing and treating steps.