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METHOD FOR INSPECTING PHOTOMASK BLANK OR INTERMEDIATE THEREOF, METHOD FOR DETERMINING DOSAGE OF HIGH-ENERGY RADIATION, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
METHOD FOR INSPECTING PHOTOMASK BLANK OR INTERMEDIATE THEREOF, METHOD FOR DETERMINING DOSAGE OF HIGH-ENERGY RADIATION, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
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机译:光掩模坯的检查方法或中间方法,高能辐射剂量的测定方法和光掩模坯的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a new inspecting photomask blank or intermediate thereof, evaluating stress of a phase shift film giving a change in surface topography causing a dimensional error in working a photomask blank, a method for determining dosage of high-energy radiation, and a method for manufacturing a photomask blank.;SOLUTION: The photomask blank or an intermediate thereof which is manufactured by depositing a phase shift film on a substrate for a photomask, and irradiating the phase shift film with high-energy radiation to effect substrate shape adjusting treatment is inspected by measuring a surface topography of the photomask blank after the substrate shape adjusting treatment, removing the phase shift film from the photomask blank or the intermediate thereof, measuring a surface topography of the treated substrate after removal of the phase shift film, and comparing the surface topographies, thereby evaluating a warpage change before and after removal of the phase shift film, due to a stress of the phase shift film having undergone substrate shape adjusting treatment. A stress to the substrate by the phase shift film after the substrate shape adjusting treatment is evaluated more accurately.;COPYRIGHT: (C)2011,JPO&INPIT
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