EXPOSURE SYSTEM, METHOD FOR MANUFACTURING EXPOSURE SYSTEM, METHOD FOR CONTROLLING TEMPERATURE OF EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure system capable of suppressing temperature fluctuation due to thermal disturbance.;SOLUTION: An exposure system for forming a predetermined pattern on a substrate using exposure light includes: a substrate stage having a movable body capable of moving while supporting the substrate; an optical member emitting the exposure light to the substrate; a structural member for supporting at least one or both of the substrate stage and the optical member; and a channel provided inside the structural member, wherein temperature control fluid capable of controlling an inside of a space formed by the structural member to a predetermined temperature flows in the channel.;COPYRIGHT: (C)2011,JPO&INPIT