F density measurement method and plasma processing method and plasma processing apparatus in the plasma processing apparatus

摘要

PROBLEM TO BE SOLVED: To provide a means for high-accuracy measuring the F density in plasma in a plasma processing apparatus.;SOLUTION: This method is a method for measuring the F density in plasma in the plasma processing apparatus 1 for applying plasma processings to a work W to be processed housed in a processing container 10. In this method, a processing gas containing at least an O₂ gas and an inert gas is used to measure the F density in the plasma processing, on the basis of a ratio [F^*]/[inert gas^*] between the light-emitting strength [F^*] of F radicals on the surface of the work W to be processed and the light emission intensity of the inert gas [inert gas^*].;COPYRIGHT: (C)2006,JPO&NCIPI