The ITO transparent electric conduction film forming a membrane in manufacturing method of the ITO transparent electric conduction film equipped substrate,

摘要

PROBLEM TO BE SOLVED: To solve the problem that it is difficult to reduce the resistance of an ITO transparent conductive membrane by film forming by a sputtering method at a temperature of 250°C or less when an organic polymer is used as a substrate, since there arises a problem that the shape of the substrate changes or the mechanical property and the electrical property change greatly by heating at film forming in the case of the substrate made of the organic polymer.;SOLUTION: This is a substrate with an ITO transparent conductive membrane in which the substrate has an organic polymer, the ITO transparent conductive membrane is made by adding 5-10 wt% of tin into indium oxide in oxide conversion, the specific resistance is in the range 1.2 × 10^-4-3.0 × 10^-4Ω cm, and the ITO transparent conductive membrane is formed by an ion plating method using a plasma gun. And the surface roughness of the ITO transparent conductive membrane is 2 nm or less. When the melting point Tm of the organic polymer forming the substrate is clear, the temperature of the substrate at the time of forming the ITO transparent conductive membrane is made in the temperature range Tg-(Tg+(Tm-Tg)/2) against the glass transition point Tg of the organic polymer.;COPYRIGHT: (C)2005,JPO&NCIPI