首页> 外国专利> METHOD FOR POLISHING TAPE-SHAPED SUBSTRATE FOR OXIDE SUPERCONDUCTOR, OXIDE SUPERCONDUCTOR, AND BASE MATERIAL FOR OXIDE SUPERCONDUCTOR

METHOD FOR POLISHING TAPE-SHAPED SUBSTRATE FOR OXIDE SUPERCONDUCTOR, OXIDE SUPERCONDUCTOR, AND BASE MATERIAL FOR OXIDE SUPERCONDUCTOR

机译:抛光氧化物超导体的带状基体的方法,氧化物超导体和氧化物超导体的基础材料

摘要

A surface polishing method for enhancing crystal orientation on the surface of a tapelike metal substrate in order to enhance the critical current of a superconducting thin film. In an oxide superconductor comprising a tapelike substrate, an intermediate layer formed on the tapelike substrate, and an oxide superconducting thin film layer formed on the intermediate layer, the method for polishing a surface to be polished of the tapelike substrate comprises a step for polishing the surface to be polished while traveling the tapelike substrate continuously, wherein an initial polishing step and a finish polishing step are included. Ultimately, the average surface roughness Ra of the polished surface is 2 nanometer or less and the in-plane orientation Δφ is 5° or less.
机译:一种表面抛光方法,用于增强带状金属基板表面的晶体取向,以增强超导薄膜的临界电流。在包括带状衬底,形成在带状衬底上的中间层和形成在中间层上的氧化物超导薄膜层的氧化物超导体中,用于抛光带状衬底的待抛光表面的方法包括用于抛光带状衬底的步骤。在使带状基材连续行进的同时被抛光的表面,其中包括初始抛光步骤和精抛光步骤。最终,抛光表面的平均表面粗糙度Ra为2纳米或更小,并且面内取向Δφ为5°或更小。

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