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Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
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机译:挥发性铜(1)配合物和通过原子层沉积法沉积铜膜的方法
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摘要
Provided are novel 1,3-diimine copper complexes, and processes for using 1,3-diimine copper complexes in the deposition of copper on substrates, or in or on porous solids, by atomic layer deposition.
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