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Wurtzite thin film, laminate containing wurtzite crystalline layer and their manufacturing methods
Wurtzite thin film, laminate containing wurtzite crystalline layer and their manufacturing methods
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机译:纤锌矿薄膜,包含纤锌矿晶体层的层压板及其制造方法
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摘要
A thin film made of a wurtzite structure compound is manufactured by a reactive sputtering using a metal material as a target, and a nitrogen gas or oxygen gas as a reactive gas. By optimizing film-forming conditions when manufacturing the film, it is possible to obtain a wurtzite thin film whose polarization directions of crystal grains are aligned in a uniform direction. There is provided a laminate including a first wurtzite crystalline layer made of a wurtzite crystalline structure compound is formed in advance between a substrate and a functional material layer that is a ground. Thus it is possible to improve the crystallinity and crystalline orientation of a second wurtzite crystalline layer on the functional material layer.
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