INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL, DEVICE MANUFACTURING METHOD, AND 2-D ZEBRA TARGET DESIGN FOR MEASURING FOCUS AND DOSE.

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  机译： 用于确定目标图案的参数的检查方法和设备，光刻设备，光刻处理单元和装置制造方法

• 4. Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method for Determining A Parameter of a Target Pattern [P] . 美国专利： US2009135424A1 . 2009-05-28

  机译： 确定目标图案参数的检查方法和设备，光刻设备，光刻处理单元和设备制造方法

• 5. Inspection method and apparatus, lithographic apparatus, lithographic processing cell, and device manufacturing method to measure a property of a substrate [P] . 美国专利： US8115926B2 . 2012-02-14

  机译： 测量基板特性的检查方法和装置，光刻装置，光刻处理单元和装置制造方法

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• 5. SUPPORT, VIBRATION ISOLATION SYSTEM, LITHOGRAPHIC APPARATUS, OBJECT MEASUREMENT APPARATUS, DEVICE MANUFACTURING METHOD [J] . Research Disclosure . 2020,第676期
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