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COMBINATORIAL APPROACH TO THE DEVELOPMENT OF CLEANING FORMULATIONS FOR GLUE REMOVAL IN SEMICONDUCTOR APPLICATIONS
COMBINATORIAL APPROACH TO THE DEVELOPMENT OF CLEANING FORMULATIONS FOR GLUE REMOVAL IN SEMICONDUCTOR APPLICATIONS
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机译:半导体应用中除胶清洁剂配方开发的组合方法
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摘要
Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.
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