METHOD FOR SELECTIVELY MASKING A SUBSTRATE DURING AN ELECTROPOLYMERISATION PROCESS

摘要

The invention relates to a method for masking at least one given area of the surface of a substrate made from a conductive and oxidisable material during an electropolymerisation process, in particular electrolysis, in order to deposit a polymer film (8) on the surface of the substrate (2). According to the invention, the electropolymerisation is performed by simultaneously exposing the area (7) to be masked to a focused beam (60) of ultrasound waves (6) having a power value higher than 1 watt. The invention is suitable for use in the electronics industry.