首页> 外国专利> ELECTROSTATIC DISCHARGE PROTECTION DEVICE AND A MANUFACTURING METHOD THEREOF, CAPABLE OF IMPROVING THE PROPERTY OF THE ELECTROSTATIC DISCHARGE PROTECTION DEVICE WITHOUT ADDITIONALLY IMPLANTING A DOPANT

ELECTROSTATIC DISCHARGE PROTECTION DEVICE AND A MANUFACTURING METHOD THEREOF, CAPABLE OF IMPROVING THE PROPERTY OF THE ELECTROSTATIC DISCHARGE PROTECTION DEVICE WITHOUT ADDITIONALLY IMPLANTING A DOPANT

机译:静电放电保护装置及其制造方法,能够在不另外注入掺杂剂的情况下提高静电放电保护装置的性能。

摘要

PURPOSE: An electrostatic discharge device and a manufacturing method thereof are provided to reduce resistance between an anode and a cathode of an electrostatic discharge protection device by forming a stack structure to increase a net doping of a guard ring.;CONSTITUTION: A high voltage first conductive well(215) is formed on a semiconductor substrate. A first stack region is formed by successively stacking the first conductive type drift region and the first conductive impurity region. A second stack region is formed by successively stacking a second conductive type drift region and a second conductive impurity region layer on the other region of the high voltage first conductive well. A device isolation layer(220) is formed between the first stack region and the second stack region to isolate the first stack region and the second stack region.;COPYRIGHT KIPO 2010
机译:目的:提供一种静电放电装置及其制造方法,其通过形成堆叠结构以增加保护环的净掺杂来减小静电放电保护装置的阳极和阴极之间的电阻。组成:高压首先在半导体衬底上形成导电阱(215)。通过依次堆叠第一导电类型漂移区和第一导电杂质区来形成第一堆叠区。通过在高压第一导电阱的另一个区域上依次堆叠第二导电类型漂移区域和第二导电杂质区域层来形成第二堆叠区域。在第一堆叠区和第二堆叠区之间形成器件隔离层(220),以隔离第一堆叠区和第二堆叠区。COPYRIGHTKIPO 2010

著录项

  • 公开/公告号KR20100074408A

    专利类型

  • 公开/公告日2010-07-02

    原文格式PDF

  • 申请/专利权人 DONGBU HITEK CO. LTD.;

    申请/专利号KR20080132822

  • 发明设计人 JANG JOON TAE;

    申请日2008-12-24

  • 分类号H01L27/04;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:21

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