首页> 外国专利> PHASE-CHANGE MEMORY UNIT, A METHOD OF FORMING THE SAME, AND A PHASE-CHANGE MEMORY DEVICE INCLUDING THE SAME, INCLUDING A BOTTOM ELECTRODE HAVING AN IMPROVED STRUCTURE

PHASE-CHANGE MEMORY UNIT, A METHOD OF FORMING THE SAME, AND A PHASE-CHANGE MEMORY DEVICE INCLUDING THE SAME, INCLUDING A BOTTOM ELECTRODE HAVING AN IMPROVED STRUCTURE

机译:相变存储器单元,其形成方法以及包括相同电极,包括具有改进结构的底部电极的相变存储器装置

摘要

PURPOSE: A phase-change memory unit, a method of forming the same, and a phase-change memory device including the same are provided to improve electrical characteristic by heating a phase change material layer pattern with small current and reducing a reset current.;CONSTITUTION: A first lower electrode structure(170) is formed on an ohmic layer(140). The first lower electrode structure comprises a first bottom electrode(174) and a second bottom electrode(172). The first bottom electrode comprises a first metal nitride having a first specific resistance. The second bottom electrode comprises a second metal nitride having a second specific resistance lower than the first specific resistance. A phase change material layer pattern(180) is formed on the lower electrode structure. The top electrode(190) is formed on the phase change material layer pattern.;COPYRIGHT KIPO 2010
机译:目的:提供一种相变存储单元,其形成方法以及包括该相变存储单元的相变存储器件,以通过以小电流加热相变材料层图案并减小复位电流来改善电特性。构成:第一下部电极结构(170)形成在欧姆层(140)上。第一下部电极结构包括第一底部电极(174)和第二底部电极(172)。第一底部电极包括具有第一电阻率的第一金属氮化物。第二底部电极包括第二金属氮化物,该第二金属氮化物的第二电阻率低于第一电阻率。在下部电极结构上形成相变材料层图案(180)。在相变材料层图案上形成顶部电极(190)。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100089132A

    专利类型

  • 公开/公告日2010-08-12

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20090008228

  • 发明设计人 LIM TAI SOO;LEE HYUN SUK;LIM HYUN SEOK;

    申请日2009-02-03

  • 分类号H01L27/115;H01L21/8247;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:08

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