SUSCEPTOR FOR VAPOR PHASE GROWTH DEVICE, AND VAPOR PHASE GROWTH DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a susceptor preventing generation of a flaw and a contact trace in a backside of an epitaxial wafer and capable of being used semipermanently.;SOLUTION: In the susceptor for a vapor phase growth device, a wafer supporting member made of glassy carbon is provided to be exchangeable in at least a wafer support region of a susceptor base material.;COPYRIGHT: (C)2011,JPO&INPIT