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LOW FRICTION SLIDING MEMBER AND LOW FRICTION SLIDING MECHANISM USING THE SAME

机译:低摩擦滑动构件和使用相同构件的低摩擦滑动机制

摘要

PPROBLEM TO BE SOLVED: To provide a low friction sliding member having more excellent and lower shearing force than MoSSB2/SBand to provide a low friction sliding mechanism using the same. PSOLUTION: This low friction sliding member has a hard carbon thin film on at least a part of a sliding face, and a tribo-film containing ether, oxide, and alcohol is formed when sliding while an organic oxygen compound exists on the hard carbon thin film (except the case where both of the sliding faces have a hard carbon thin film composed of a-C diamond-like carbon, and lubricating oil containing poly--olefin and glycerol monooleate exists between the sliding faces). The tribo-film is formed in a scope of depth of 10 nm or less from a sliding surface of the hard carbon thin film. The low friction sliding mechanism uses the low friction sliding member and includes the organic oxygen compound on the sliding face formed by the low friction sliding members and the sliding face formed by the low friction sliding member and a metallic member. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:提供一种具有比MoS 2 更好和更低的剪切力的低摩擦滑动构件,并提供使用该构件的低摩擦滑动机构。

解决方案:该低摩擦滑动部件在滑动面的至少一部分上具有硬质碳薄膜,并且在滑动时,当有机氧化合物上存在有机氧化合物时,会形成含有醚,氧化物和醇的摩擦膜。硬碳薄膜(两个滑动面均具有由aC类金刚石碳构成的硬碳薄膜,并且在滑动面之间存在含有聚烯烃和甘油单油酸酯的润滑油的情况除外)。摩擦膜形成在距硬碳薄膜的滑动表面10nm或更小的深度范围内。低摩擦滑动机构使用低摩擦滑动构件,并且在由低摩擦滑动构件形成的滑动面和由低摩擦滑动构件和金属构件形成的滑动面上包括有机氧化合物。

版权:(C)2011,日本特许厅&INPIT

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