Oblique incidence light condensing optical system of laser formation plasma source

摘要

Topic Lithography and image pickup are included, the extreme ultraviolet of 13.5nm and the like (EUV) or being light condensing optical system of the x-ray, the laser formation plasma (LPP) it offers the oblique incidence condenser which is combined with source. SolutionsRegarding one execution form, as for laser light, gives impact from the intermediate focus side vis-a-vis the fuel target the other optical element of one or more, by operating the laser light of one or more which is used for the formation of EUV or x-ray plasma source. In addition, being the condenser which is used for EUV and the x-ray, it makes the light from the laser formation plasma illuminant reflect with the condenser vis-a-vis the intermediate focus, the line which ties with the illuminant and the intermediate focus forms the optical axis, 1st direction on the optical axis is formed from the illuminant to the intermediate focus. The condenser has the oblique incidence mirror of one or more, the condenser in order in acute angle, incidence to do in the illuminant (a) to 1st direction in the 2nd direction which is opposite direction, or (b) vis-a-vis 2nd direction, has the other optical element of one or more which changes the direction of the laser light which absorbs light. Selective figure Figure 3