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In the substrate heating system and the substrate heating

机译:在基板加热系统和基板加热中

摘要

PROBLEM TO BE SOLVED: To provide a substrate heating device and a substrate heating method for achieving rapid heating and stable temperature control by a simple configuration.;SOLUTION: The substrate heating device is disposed in an opening 3a of a carrier 3 for heating a substrate 4. The substrate 4 has a plurality of downwardly projected pin terminals 4c on the lower surface thereof. A protruded member 14 projected directed to the lower plane of the substrate 4 is provided on the heating unit 11. Gas heated by a heating unit 11 is intermittently blown to the lower surface of the substrate 4 from the upper surface of the protruded member 14 using an on/off-valve. The substrate 4 is heated by radiation to a heat receiving plane 4d surrounded by the pin terminals 4c from the heating plane of the upper surface of the projected member 14. The temperature of the substrate 4 is maintained at a target temperature by being rapidly heated at the starting of the heating by continuously blowing the heated gas to the substrate 4 in the open state of the on/off-valve and by intermittently blowing the gas by repeatedly actuating the on/off-valve.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种基板加热装置和基板加热方法,以通过简单的配置实现快速加热和稳定的温度控制。解决方案:基板加热装置设置在用于加热基板的载体3的开口3a中。基板4在其下表面上具有多个向下突出的引脚端子4c。在加热单元11上设置有向基板4的下表面突出的突出部件14。利用加热单元11加热的气体通过使用该单元从突出部件14的上表面间歇地吹到基板4的下表面。开/关阀。基板4通过辐射从突出部件14的上表面的加热平面加热到由引脚端子4c围绕的受热平面4d。通过在20℃下快速加热基板4的温度,将基板4的温度保持在目标温度。通过在开/关阀的打开状态下将被加热的气体连续吹向基板4以及通过反复致动开/关阀来间歇地吹气来开始加热。;版权:(C)2008,日本特许厅

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