首页> 外国专利> BACKSIDE ILLUMINATED IMAGING DEVICE, SEMICONDUCTOR SUBSTRATE, IMAGING APPARATUS AND METHOD FOR MANUFACTURING BACKSIDE ILLUMINATED IMAGING DEVICE

BACKSIDE ILLUMINATED IMAGING DEVICE, SEMICONDUCTOR SUBSTRATE, IMAGING APPARATUS AND METHOD FOR MANUFACTURING BACKSIDE ILLUMINATED IMAGING DEVICE

机译:背面照明成像设备,半导体基板,成像设备以及制造背面照明成像设备的方法

摘要

A backside illuminated imaging device performs imaging by illuminating light from a back side of a p substrate to generate electric charges in the substrate based on the light and reading out the electric charges from a front side of the substrate. The device includes n layers located in the substrate and on an identical plane near a front side surface of the substrate and accumulating the electric charges; n+ layers between the respective n layers and the front side of the substrate, the n+ layers having an exposed surface exposed on the front side surface of the substrate and functioning as overflow drains for discharging unnecessary electric charges accumulated in the n layers; p+ layers between the respective n+ layers and the n layers and functioning as overflow barriers of the overflow drains; and an electrode connected to the exposed surface of each of the n+ layers.
机译:背面照明成像装置通过从p基板的背面照射光以基于该光在基板中产生电荷并且从基板的正面读出电荷来执行成像。该装置包括位于基板中并且在基板的前侧表面附近的相同平面上的n层,并累积电荷。在各n层与衬底的正面之间的n +层,n +层具有暴露的表面,该暴露的表面暴露在衬底的前表面上,并且用作用于排放在n层中累积的不必要的电荷的溢漏。在各个n +层和n层之间的p +层用作溢流漏极的溢流屏障。电极连接到每个n +层的暴露表面。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号