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Source offset MOSFET optimized for current voltage characteristic invariance with respect to changing temperatures

机译:针对电流电压特性随温度变化而优化的源极偏置MOSFET

摘要

A semiconductor device is disclosed. The semiconductor device includes a source offset type MOS transistor in which a source and a drain are formed on a semiconductor substrate by having a predetermined distance between the source and the drain, and a gate electrode is formed on the semiconductor substrate between the source and the drain via a gate insulation film. One end of the drain overlaps or abuts on one end of the gate electrode when viewed from above the gate electrode, and the source is formed by having a distance from the gate electrode when viewed from above the gate electrode.
机译:公开了一种半导体器件。该半导体器件包括源极偏移型MOS晶体管,其中,通过在源极和漏极之间具有预定距离,在半导体衬底上形成源极和漏极,并且在源极和漏极之间的半导体衬底上形成栅电极。通过栅极绝缘膜排空。当从栅电极上方观察时,漏极的一端与栅电极的一端重叠或邻接,并且当从栅电极上方观察时,源极通过与栅电极具有一定距离而形成。

著录项

  • 公开/公告号US7906820B2

    专利类型

  • 公开/公告日2011-03-15

    原文格式PDF

  • 申请/专利权人 MASAYA OHTSUKA;

    申请/专利号US20080263127

  • 发明设计人 MASAYA OHTSUKA;

    申请日2008-10-31

  • 分类号H01L29/06;

  • 国家 US

  • 入库时间 2022-08-21 18:09:18

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