首页> 外国专利> Capacitor, FeFET and FeFET type non-volatile memory with ordered ferroelectirc PVDF-TrFE thin film by high throughput epitaxy

Capacitor, FeFET and FeFET type non-volatile memory with ordered ferroelectirc PVDF-TrFE thin film by high throughput epitaxy

机译:具有高通量外延的有序铁电PVDF-TrFE薄膜的电容器,FeFET和FeFET型非易失性存储器

摘要

PURPOSE: A capacitor applying an epitaxial crystal growth PVDF-TrFE thin film, an FeFET and an FeFET type nonvolatile memory are provided to be efficiently used as an array of a ferroelectric capacitor by including a low driving voltage and a high temperature processing ability. CONSTITUTION: A bottom electrode is formed on a substrate. A single crystal PTFE film is formed on the upper side of the lower electrode. An epitaxial growth PVDF-TrFE ferroelectric film is formed on the upper side of the single PTFE film. An upper electrode is formed on the upper side of the epitaxial growth PVDF-TrFE ferroelectric film. The single crystal PTFE film is manufactured by a friction transfer process.
机译:用途:应用外延晶体生长PVDF-TrFE薄膜的电容器,FeFET和FeFET型非易失性存储器通过提供低驱动电压和高温处理能力而有效地用作铁电电容器阵列。组成:底部电极形成在基板上。在下部电极的上侧形成单晶PTFE膜。在单个PTFE膜的上侧形成外延生长PVDF-TrFE铁电膜。在外延生长PVDF-TrFE铁电膜的上侧形成上电极。单晶PTFE膜是通过摩擦传递工艺制造的。

著录项

  • 公开/公告号KR100999721B1

    专利类型

  • 公开/公告日2010-12-08

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20080129943

  • 发明设计人 박철민;박연정;강석주;

    申请日2008-12-19

  • 分类号H01L27/105;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:55

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