METHOD FOR COMPENSATING THE PLANARITY OF A STAGE AND SUBSTRATE INSPECTING DEVICE, WHICH CAN MEASURE AND COMPENSATE THE PLANARITY OF A STAGE

摘要

PURPOSE: A method for compensating the planarity of a stage and substrate inspecting device is provided to measure and compensate the planarity of the stage. ;CONSTITUTION: A method for compensating the planarity of a stage and substrate inspecting device comprises a stage and a detection member. A substrate is settled on the stage. A detection member measures the planarity of the circumference per a location of the stage. A laser displacing sensor(93) is moved by a moving part(91).;COPYRIGHT KIPO 2011