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PUPIL SHAPE ANALYZING METHOD OF AN EXPOSURE APPARATUS CAPABLE OF PERFORMING A CORRECTION PROCESS WITH RESPECT TO A PUPIL WHICH DEVIATES FROM A TOLERANCE RANGE
PUPIL SHAPE ANALYZING METHOD OF AN EXPOSURE APPARATUS CAPABLE OF PERFORMING A CORRECTION PROCESS WITH RESPECT TO A PUPIL WHICH DEVIATES FROM A TOLERANCE RANGE
PURPOSE: A pupil shape analyzing method of an exposure apparatus is provided to perform the quantification of pupil variations for each section with respect to the abnormally measured light intensity of a pupil, thereby providing accurate and quantitative description of the pupil variations.;CONSTITUTION: A pupil image of an exposure apparatus used for a wafer exposure is arranged by including an opening part and an opening part excluding area(S110). The intensity of light corresponding to each opening part and opening part excluding area is collected from the pupil image(S120). A light intensity value is detected in the opening part excluding area(S130). A residual light intensity value is detected from the target pupil image in which the light intensity value is detected in the opening part excluding area(S140). The residual light intensity value which is compared with a process tolerant standard is applied in the exposure apparatus.;COPYRIGHT KIPO 2012
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