首页> 外国专利> PUPIL SHAPE ANALYZING METHOD OF AN EXPOSURE APPARATUS CAPABLE OF PERFORMING A CORRECTION PROCESS WITH RESPECT TO A PUPIL WHICH DEVIATES FROM A TOLERANCE RANGE

PUPIL SHAPE ANALYZING METHOD OF AN EXPOSURE APPARATUS CAPABLE OF PERFORMING A CORRECTION PROCESS WITH RESPECT TO A PUPIL WHICH DEVIATES FROM A TOLERANCE RANGE

机译:相对于公差范围内的小学生能够执行校正过程的曝光设备的小学生形状分析方法

摘要

PURPOSE: A pupil shape analyzing method of an exposure apparatus is provided to perform the quantification of pupil variations for each section with respect to the abnormally measured light intensity of a pupil, thereby providing accurate and quantitative description of the pupil variations.;CONSTITUTION: A pupil image of an exposure apparatus used for a wafer exposure is arranged by including an opening part and an opening part excluding area(S110). The intensity of light corresponding to each opening part and opening part excluding area is collected from the pupil image(S120). A light intensity value is detected in the opening part excluding area(S130). A residual light intensity value is detected from the target pupil image in which the light intensity value is detected in the opening part excluding area(S140). The residual light intensity value which is compared with a process tolerant standard is applied in the exposure apparatus.;COPYRIGHT KIPO 2012
机译:目的:提供一种曝光设备的瞳孔形状分析方法,以相对于异常测量的瞳孔光强度对每个区域的瞳孔变化进行量化,从而提供对瞳孔变化的准确和定量的描述。通过包括开口部分和不包括区域的开口部分来布置用于晶片曝光的曝光设备的光瞳图像(S110)。从瞳孔图像收集与每个开口部分和开口部分除区域相对应的光强度(S120)。在开口部以外的区域中检测光强度值(S130)。从目标瞳孔图像中检测剩余光强度值,在该目标瞳孔图像中,在开口区域中不包括区域的光强度值被检测到(S140)。与耐光标准相比较的残留光强度值应用于曝光设备。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110121463A

    专利类型

  • 公开/公告日2011-11-07

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20100041063

  • 发明设计人 PARK CHAN HA;

    申请日2010-04-30

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:50:49

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